Автор туралы ақпарат

Бетелин, В. Б.

Шығарылым	Бөлім	Атауы	Файл
Том 52, № 5 (2023)	ПЛАЗМЕННЫЕ ТЕХНОЛОГИИ	The Influence of Small F2, H2, and HF Additives on the Concentration of Active Particles in Tetrafluoromethane Plasma
Том 52, № 2 (2023)	ТЕХНОЛОГИЯ	Plasma Parameters and Kinetics of Reactive Ion Etching of SiO2 and Si3N4 in an HBr/Cl2/Ar Mixture
Том 53, № 6 (2024)	ТЕХНОЛОГИИ	Plasma Parameters and Si/SiO₂ Etching Kinetics in Mixtures of Fluorocarbon Gases with Argon and Helium